Hae Eun Joung
Kirkland & Ellis, LLP


Address: New York, NY 10022-4611, United States of America

Hae Eun Joung (Reigstration# 5709506) is an attorney registered with New York State, Office of Court Administration. The admitted year is 2019.

Attorney Overview

Registration Number 5709506
Full Name HAE EUN JOUNG
Company / Organization Kirkland & Ellis, LLP
Address New York
NY 10022-4611
United States of America
County New York
Law School Harvard Law School
Judicial Department of Admission Second Department (seated in Brooklyn)
Year Admitted 2019
Status Currently registered

Company Information

Company / Organization Name Kirkland & Ellis, LLP

Attorneys in the same organization

Name Company / Organization Address
Matthew Richard Benedetto KIRKLAND & ELLIS, LLP New York, NY 10022-4611, United States of America
Erica D. Clark Kirkland & Ellis, LLP New York, NY 10022-4611, United States of America
Zeynep Tekin KIRKLAND & ELLIS, LLP San Francisco, CA 94104-1503, United States of America
Hyunjong Jin KIRKLAND & ELLIS, LLP New York, NY 10022-4611, UNITED STATES OF AMERICA
Brian Robert Ford KIRKLAND & ELLIS, LLP Los Angeles, CA 90067-3211, UNITED STATES OF AMERICA
Evan J. Skaar KIRKLAND & ELLIS, LLP Chicago, IL 60654-3406, UNITED STATES OF AMERICA
James Courtney Robinson KIRKLAND & ELLIS, LLP Washington, DC 20004-1701, UNITED STATES OF AMERICA
Michael Alan Cooper Kirkland & Ellis, LLP Chicago, IL 60654-3406, United States of America
Melissa Marjorie Harclerode KIRKLAND & ELLIS, LLP Washington, DC 20004-1701, UNITED STATES OF AMERICA
Aparna Venkata Yenamandra KIRKLAND & ELLIS, LLP New York, NY 10022-4611, United States of America
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School Information

Law School Harvard Law School

Attorneys in the same law school

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Ariel Toni Ashtamker Communities Resist Brooklyn, NY 11211-1727, United States of America
Ryan Michael Folio KELLOGG HANSEN TODD FIGEL & FREDERICK PLLC Washington, DC 20036-3215, United States of America
Zachary Tyler Ellis Eastern District of Arkansas Little Rock, AR 72201-3398, United States of America
Zoe Essner Weil, Gotshal and Manges New York, NY 10153-0023, United States of America
Benjamin Daniel Pittenger Simpson Thacher & Bartlett LLP New York, NY 10017-3903, United States of America
Philip David Stachnik Gibson, Dunn & Crutcher LLP New York, NY 10166-0193, United States of America
Lyall Alter Stuart New York, NY 10001-2177, UNITED STATES OF AMERICA
Oliver Henry Fierman Pare New York, NY 10022-4611, UNITED STATES OF AMERICA
Yunxi Li Shanghai 200031, CHINA
Daniel Aiman Moubayed New York, NY 10017-3904, UNITED STATES OF AMERICA
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Office Location

Street Address
City New York
State NY
Zip 10022
Country United States of America

Attorneys in the same city

Name Company / Organization Address
William Benton Lewis Jr. WEIL, GOTSHAL & MANGES LLP New York, 10153
Kyle Donald Winnick Chamberlain, Hrdlicka, White, Williams & Aughtry New York, GA 30303, United States of America
Noran Elzarka Brooklyn Defender Services New York, NJ 07417, United States of America
Laila Moussa Maher COLUMBIA UNIVERSITY SCHOOL OF THE ARTS New York, NJ 10027, United States of America
Chuck Christopher English RVM TECHNOLOGIES IN New York, NY 10006-1705, United States of America
Stephanie Anne Plana MCGIVNEY, KLUGER & COOK New York, NY 10004-2209, United States of America
Laura Longwei Chao Gunderson Dettmer Stough Villeneuve Franklin & Hachigian LLP New York, NY 10036-7200, United States of America
Daniel S. Weinstein Proskauer Rose LLP New York, NY 10036-6600, United States of America
Sarah Elsheryie Covington & Burling New York, NY 10018, United States of America
Curtis Blake Vella Weil, Gotshal & Manges LLP New York, NY 10153-0119, United States of America
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Dataset Information

Data Provider New York State, Office of Court Administration
Jurisdiction New York State
Related Datasets New York State Corporations

This dataset includes 357 thousand attorneys registered with New York State, Office of Court Administration. Each attorney is registered with registration number, full name, company name and address, phone number, email, year admitted, etc.